Structure/Chemistry/Properties of Ion Plated Nickel Films on Glass-Ceramic Substrates
by
Mihir Mahendra Shah
J. M. Rigsbee
Abstract
This investigation examines the relationship between the structure, chemistry and resultant properties of nickel films deposited onto cordierite glass-ceramic substrates via ion plating (a plasma assisted physical vapor deposition technique) using a combination of processing variables. Film adhesion, evaluated using an expoxy bonded stub pull test, is used to qualify the integrity of the metal/ceramic bond. A complete range of structural and chemical microanalysis techniques, including SEM, TEM, Auger microprobe, and SIMS, is employed to characterize the nature of the film, substrate, and interfacial region. Sputter cleaning prior to deposition has a pronounced effect on adhesion, providing an excellent bond for films deposited without an applied bias. Film morphology shows a transition from columnar to equiaxed as the bias applied during deposition is increased. Energetic particle bombardment from the glow discharge can cause structural and chemical modifications of the cordierite. Chemical mixing across the interface, characteristic of ion plating, is confirmed. A processing window is defined such that highly adherent nickel films can be deposited on cordierite substrates via ion plating.
Download (4 MB)